Repozytorium
Wyszukaj
Kolekcje
Inne
Directed growth of electroactive metal-organic framework thin films using electrophoretic deposition.
Autorzy
Rok wydania
2014
Czasopismo
Numer woluminu
26
Strony
6295-6300
DOI
10.1002/adma.201401940
Kolekcja
Język
Angielski
Typ publikacji
Artykuł
Electrophoretic deposition (EPD) is used to assemble metal–organic framework (MOF) materials in nano‐ and micro‐particulate, thin‐film form. The flexibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU‐1000, UiO‐66, HKUST‐1, and Al‐MIL‐53. Additionally, EPD is used to pattern the growth of NU‐1000 thin films that exhibit full electrochemical activity.
Słowa kluczowe
metal organic frameworks, electrophoretic deposition, thin films, electrochemical
Adres publiczny
http://dx.doi.org/10.1002/adma.201401940
Strona internetowa wydawcy
Podobne publikacje
A porous proton-relaying metal-organic framework material that accelerates electrochemical hydrogen evolution.
Hod Idan, Deria Pravas, Bury Wojciech, Mondloch Joseph E., Kung Chung-Wei, So Monica, Sampson Matthew D., Peters Aaron W., Kubiak Cliff P., Farha Omar K., Hupp Joseph T.
Metal-organic framework thin films as platforms for atomic layer deposition of cobalt ions to enable electrocatalytic water oxidation.
Kung Chung-Wei, Mondloch Joseph E., Wang Timothy Chiaan, Bury Wojciech, Hoffeditz William, Klahr Benjamin, Klet Rachel C., Pellin Michael J., Farha Omar K., Hupp Joseph T.
Fluorescent ionic liquid micro reservoirs fabricated by dual-step E-beam patterning.
Kowal Dominik, Rola Krzysztof P., Cybińska Joanna, Skoreński Marcin, Zajac Adrian, Szpecht Andrea, Śmiglak Marcin, Drobczynski Slawomir, Ciesiolkiewicz Karolina, Komorowska Katarzyna