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Inne
Vapor-phase metalation by atomic layer deposition in a metal-organic framework.
Autorzy
Rok wydania
2013
Czasopismo
Journal of the American Chemical Society
Numer woluminu
135
Strony
10294-10297
DOI
10.1021/ja4050828
Kolekcja
Język
Angielski
Typ publikacji
Artykuł
Metal–organic frameworks (MOFs) have received attention for a myriad of potential applications including catalysis, gas storage, and gas separation. Coordinatively unsaturated metal ions often enable key functional behavior of these materials. Most commonly, MOFs have been metalated from the condensed phase (i.e., from solution). Here we introduce a new synthetic strategy capable of metallating MOFs from the gas phase: atomic layer deposition (ALD). Key to enabling metalation by ALD In MOFs (AIM) was the synthesis of NU-1000, a new, thermally stable, Zr-based MOF with spatially oriented −OH groups and large 1D mesopores and apertures.
Adres publiczny
http://dx.doi.org/10.1021/ja4050828
Strona internetowa wydawcy
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