Repozytorium

Influence of the internal bias field on the movement of the domain walls in (CH3NH3)5Bi2Cl11 crystals.

Autorzy

K. Matyjasek

Ryszard Jakubas

Rok wydania

1997

Czasopismo

Ferroelectrics

Numer woluminu

190

Strony

25-30

DOI

10.1080/00150199708014088

Kolekcja

Naukowa

Język

Angielski

Typ publikacji

Artykuł

Streszczenie

The effect of internal bias field on the field - induced movement of the domain walls in (CH 3 NH 3)5 Bi 2 Br 11 crystals has been investigated using liquid crystal decoration technique (NLC). The measurements were carried out in dc - electric field and alternate square pulses of electric fields. Comparison was made of the nucleation process in (CH 3 NH 3)5 Bi 2 Br 11 and TGS crystals. The difference was explained in terms of difference of activation energy for domain wall motion.

Słowa kluczowe

Ferroelectric domain, nucleation, bias field, (CH 3 NH 3)5 Bi 2 Br 11, TGS

Adres publiczny

https://doi.org/10.1080/00150199708014088

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